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CVD SICフォーカスリング
  • CVD SICフォーカスリングCVD SICフォーカスリング

CVD SICフォーカスリング

Vetek Semiconductorは、CVD SICフォーカスリングの国内メーカーおよびサプライヤーであり、半導体業界向けの高性能で高解放性製品ソリューションを提供することに専念しています。 VETEK半導体のCVD SICフォーカスリングは、高度な化学蒸気堆積(CVD)テクノロジーを使用し、優れた高温抵抗、腐食抵抗、熱伝導率を持ち、半導体リソグラフィプロセスで広く使用されています。お問い合わせはいつでも大歓迎です。

As the foundation of modern electronic devices and information technology, semiconductor technology has become an indispensable part of today's society. From smartphones to computers, communication equipment, medical equipment and solar cells, almost all modern technologies rely on the manufacture and application of semiconductor devices.


As the requirements for functional integration and performance of electronic devices continue to increase, semiconductor process technology is also constantly evolving and improving. As the core link in semiconductor technology, the etching process directly determines the structure and characteristics of the device.


The etching process is used to accurately remove or adjust the material on the surface of the semiconductor to form the desired structure and circuit pattern. These structures determine the performance and functionality of semiconductor devices. The etching process is able to achieve nanometer-level precision, which is the basis for manufacturing high-density, high-performance integrated circuits (ICs).


CVD SiC Focus Ring is a core component in dry etching, mainly used to focus plasma to make it have higher density and energy on the wafer surface. It has the function of evenly distributing gas. VeTek Semiconductor grows SiC layer by layer through the CVD process and finally obtains the CVD SiC Focus Ring. The prepared CVD SiC Focus Ring can perfectly meet the requirements of the etching process.


CVD SiC Focus Ring working diagram

CVD SiC Focus Ring is excellent in mechanical properties, chemical properties, thermal conductivity, high temperature resistance, ion etching resistance, etc.


● High density reduces etching volume

● High band gap and excellent insulation

● High thermal conductivity, low expansion coefficient, and heat shock resistance

● High elasticity and good mechanical impact resistance

● High hardness, wear resistance, and corrosion resistance


VeTek Semiconductor has the leading CVD SiC Focus Ring processing capabilities in China. Meanwhile, VeTek Semiconductor's mature technical team and sales team help us provide customers with the most suitable focus ring products. Choosing VeTek semiconductor means partnering with a company committed to pushing the boundaries of CVD silicon carbide innovation.


With a strong emphasis on quality, performance, and customer satisfaction, we deliver products that not only meet but exceed the rigorous demands of the semiconductor industry. Let us help you achieve greater efficiency, reliability, and success in your operations with our advanced  CVD silicon Carbide solutions.


SEM DATA OF CVD SIC FILM

SEM DATA OF CVD SIC COATING FILM


Basic physical properties of CVD SiC coating

Basic physical properties of CVD SiC coating
Property
Typical Value
Crystal Structure
FCC β phase polycrystalline, mainly (111) oriented
SiC coating Density
3.21 g/cm³
SiC coating Hardness
2500 Vickers hardness(500g load)
Grain SiZe
2~10μm
Chemical Purity
99.99995%
Heat Capacity
640 J·kg-1·K-1
Sublimation Temperature
2700℃
Flexural Strength
415 MPa RT 4-point
Young' s Modulus
430 Gpa 4pt bend, 1300℃
Thermal Conductivity
300W·m-1·K-1
Thermal Expansion(CTE)
4.5×10-6K-1

VeTek Semiconductor CVD SiC Focus Ring products shops:

Semiconductor process equipmentSiC Coating Wafer CarrierCVD SiC Focus RingOxidation and Diffusion Furnace Equipment

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